The leading metal oxide film candidate that offers up to ten-times higher electron mobility than amorphous silicon (a-Si) is indium gallium zinc oxide (IGZO).
Applied’s new AKT 55KS PECVD system brings market-leading precision plasma-enhanced chemical vapor deposition (PECVD) technology to...
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With minimal mechanical motion the AKT EBT TFT array tester realizes high-reliability, low scheduled down time and low running cost. The...
The AKT-PiVot 55K DT PVD and 25K DT PVD systems deposit critical film layers that create TFTs and interconnects on 2200mm x 2500mm and...
