Chemical Vapor Deposition (CVD) is used by flat panel display (FPD) manufacturers to deposit most of the layers, commonly called “films,” which function as dielectrics (insulators) or semiconductors (partial conductors).
Applied’s new AKT 55KS PECVD system brings market-leading precision plasma-enhanced chemical vapor deposition (PECVD) technology to...
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AKT-PECVD systems offer processes for both amorphous silicon (a-Si) and metal oxide (MOx) backplane technologies. Available films...
The Applied AKT-PX family of PECVD systems deposits highly-uniform low temperature polysilicon (LTPS) films on glass substrates from 1.6...
