Ion implantation (a form of doping) is integral to integrated circuit manufacturing. As the complexity of chips has grown, so has the number of implant steps. Today, a CMOS integrated circuit with embedded memory may require up to 60 implants.
Below the 65nm technology node, the limitations of conventional batch high-energy implanters create device performance issues for high-...
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The new system leverages the proven world-class particle performance of the VIISta platform beam line architecture. A filter magnet...
Repeatable and accurate implant angle control is critical for precision doping in high-volume manufacturing of advanced...
Innovations on the dual-magnet ribbon beam architecture improve beam line transmission, on-wafer beam utilization, and beam current...
The system delivers industry-leading dose retention and uniformity, with key features enabling the following benefits:
The new VIISta Trident system is the semiconductor industry’s most advanced single-wafer high-current ion implantation solution....
