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    Applied Botticelli™

    BOTTICELLI LED SOLAR SIMULATOR

    Applied's light-emitting diode (LED) Solar Simulator is a class A+A+A+ LED-based flasher for IV...

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    Applied Tempo™ Presto™

    TEMPO PRESTO LARGE WAFERS

    Tempo Presto Large Wafers (LW) is the current masterpiece platform for solar cells metallization; the...

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    Applied Tempo™ Presto™ PE

    TEMPO PRESTO for PRINTED ELECTRONICS

    Tempo Presto for Printed Electronics (TP_PE) is the latest screen-printer product launched...

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    Producer GT CVD Platform Angle View

    Producer® Precision® APF® PECVD

    The Applied Producer Precision APF PECVD system produces a family of strippable amorphous carbon hard mask films for critical...

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    Activity Manager

    Activity Manager

    In semiconductor manufacturing, unrealized manufacturing capacity, lag‐time due to workstation events and exception handling can all...

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    Aera™ 4 Mask Inspection

    The Applied Aera 4 Mask Inspection system is a fourth-generation 193nm-based inspection tool unique in combining true aerial imaging...

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    Aeris®-G Plasma Abatement System

    The Applied Aeris-G system is a pre-pump plasma abatement solution that uses less energy by treating the actual process gas volume—a...

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    Aeris-S

    Aeris®-S

    Designed to treat the “dirtiest” applications, the Aeris-S operates by converting problematic materials into compounds that can be...

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    Aeris-Si

    Aeris®-Si

    Aeris-Si is an integrated solution for subfab foreline cleaning to manage silica load and improve pump lifetime. The solution enables a...

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    AKT 55KS PECVD

    AKT® 55KS PECVD

    Applied’s new AKT 55KS PECVD system brings market-leading precision plasma-enhanced chemical vapor deposition (PECVD) technology to...

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    AKT® eBeam Array Test

    With minimal mechanical motion the AKT EBT TFT array tester realizes high-reliability, low scheduled down time and low running cost. The...

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    AKT® eBeam Review

    Current inline automated optical defect inspection tools for displays are not as effective as scanning electron microscopy (SEM)...

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    AKT® NEW ARISTO™ FULL DYNAMIC PVD SYSTEM

    AKT's vertical dynamic sputtering system, the NEW ARISTO provides the highest throughput in the industry while providing superior film...

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    AKT®-PECVD System
    for Amorphous Silicon Application

    AKT-PECVD systems offer processes for both amorphous silicon (a-Si) and metal oxide (MOx) backplane technologies. Available films...

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    AKT®-PIVOT™ 25PX PVD

    The AKT-PiVot System 25KPX PVD is tailored for the Gen6 (1500x1850 mm²) LTPS/LTPO mobile market depositing critical film layers IGZO,...

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    AKT®-PIVOT™ DT PVD

    AKT®-PiVot™ DT PVD

    The AKT-PiVot System 25K DT PVD, 55K DT PVD and 100K PVD deposit critical film layers such as ITO, IGZO and Metal that create TFTs and...

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    AKT®-PX PECVD

    The Applied AKT-PX family of PECVD systems deposits highly-uniform low temperature polysilicon (LTPS) films on glass substrates from 1.6...

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    ALTA 4700DP

    ALTA® 4700DP Mask Writer

    The ALTA 4700DP system provides cost-effective patterning of binary masks and phase shifting masks (PSM), supporting fast turnaround and...

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    Analytics & Control

    SmartFactory Rx Analytics & Control increases yield, prevents deviations, and assures quality.

    Monitoring and advanced control...

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    RTD and Reporter

    APF RTD

    Based on the proven technology of APF RTD®, the potential to produce more with the same equipment and personnel, while doing it in a...

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    APPLIED CLEANCOAT®

    CleanCoat is a plasma coating Total Kit Management™ solution that delivers higher surface roughness and increased surface area. It...

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    APPLIED HEADSMART®

    HeadSmart is a Total Kit Management™ CMP head rebuild service that combines cleaning, part replacement, re-assembly and...

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    Applied MDLx™ Ginestra® Simulation Software

    Ginestra® is a software product designed to simulate the operation and electrical characteristics of modern logic (e.g., FinFET, FeFET)...

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    Applied PECVD 5.7™

    The Applied PECVD 5.7 system deposits the active layers of thin film silicon solar panels on glass substrates up to 5.7m2 in area – the...

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