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Producer® CVD 200mm

The need for additional, advanced 200mm Chemical Vapor Deposition technology has increased to support fabrication requirements in the ‘More than Moore’ market, including MEMS, power devices and packaging. Thicker films (≥20µm), lower temperatures (180° to 350°C), higher conformality, and new materials like low temperature PECVD Silicon Germanium (SiGe) and amorphous silicon (a-Si), are some examples of new CVD technologies being developed to support this market.

With more than 3,000 systems shipped worldwide, the Applied Producer is the industry’s most cost-effective wafer processing platform. Its innovative Twin Chamber architecture enables simultaneous processing of up to six wafers for superior productivity.

The Producer system supports traditional PECVD (TEOS and Silane-based oxides and nitrides) and Sub-atmospheric CVD films, as well as advanced processes, including low k, strain engineering, litho-enabling films, thermal films, high-temperature PECVD applications, SiGe and amorphous silicon.

Utilizing ceramic heaters and chamber components and a remote plasma source for chamber cleans, the Applied Producer delivers the lowest defectivity performance for CVD films. Platform extendibility enables customers to leverage the Producer toolset for multiple device types and process nodes.