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Leveraging Applied’s epitaxy expertise gained with the industry-leading Centura RP Epi system over almost two decades, the Centura Prime...
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In the drive to maximize the functionality-to-volume ratio, device makers are integrating chips using schemes. TSV technology...
EUV photomasks differ fundamentally from conventional photomasks that selectively transmit 193nm wavelength light to project circuit...
The Applied Centura Tetra Z Photomask Etch system delivers state-of-the-art performance required to etch optical lithography photomasks...
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading...
Our Certified Refurbishment service is a perfect solution for customers looking for a simple way to repair broken parts and save the...
The Applied Materials Charger UBM PVD system defines a new standard in metal deposition productivity and reliability for chip...
Applied Materials continues to extend its technical leadership in metallization, introducing the most significant material innovation in...
Applied SmartFactory Dispatching & Reporting is an automated decision system that improves factory productivity and reduces...
High complexity in manufacturing requires sophisticated durable management. Such complexity can be effectively managed only through...
The Applied Endura ALPS (Advanced Low-Pressure Source) Cobalt PVD (Physical Vapor Deposition) system offers a simple, high-performance...
To date, ionized physical vapor deposition (PVD) has been able to achieve the required thickness and continuity of coverage on...
The Endura Avenir system's RF PVD technology addresses high-k/metal gate applications as well as logic contact silicidation to 22nm and...
As integrated circuits and their components continue to scale downward, the dimensions of metal interconnects and contacts between...
Revolutionizing physical vapor deposition (PVD) technology for titanium nitride (TiN) thin films, the Endura Cirrus HTX TiN solves...
The Applied Endura Clover MRAM PVD system is the first production-worthy, integrated platform for high-volume manufacturing (HVM) of...
The thickness tuning capability of the EnCoRe II Ta(N) chamber enables customers to reduce barrier thickness for line...
The system offers a cost-effective way of using ALD (atomic layer deposition) technology to extend customers' existing iLB PVD/CVD...
The Applied Endura® Impulse™ PVD system is a production-worthy, integrated solution for high-volume manufacturing (HVM) of phase-change...
Emerging applications in micro-electro-mechanical systems (MEMS), CMOS image sensors and packaging technologies such as through-silicon...
Active wafer temperature control and stress modulation facilitate integration between interconnect metals and solder bumps with low cost...
Designed specifically for TSV metallization, the Applied Endura Ventura PVD system is Applied’s latest innovation in physical...
Tungsten has been widely used in logic contact, middle-of-line, and metal gate fill applications for its low resistivity and conformal...