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A photomask contains the pattern of an integrated circuit. And as transistors have become smaller and smaller, photomasks have become more complex to accurately transfer the pattern to silicon wafers. The process of creating photomasks has become correspondingly more advanced—even slight defects in a photomask can impact silicon device performance. Verifying that the photomask pattern is accurate and defect-free is critical, especially in the case of high-revenue-earning chips.